Atomic Layer Deposition for Semiconductors |
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| Editor:
| Hwang, Cheol Seong |
| ISBN: | 978-1-4614-8053-2 |
| Publication Date: | Oct 2013 |
| Publisher: | Springer
|
| Book Format: | Hardback |
| List Price: | USD $179.99 |
Book Description:
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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.