Computational Lithography |
|
| Author:
| Ma, Xu
Arce, Gonzalo R. |
| Series title: | Wiley Series in Pure and Applied Optics Ser. |
| ISBN: | 978-0-470-59697-5 |
| Publication Date: | Jul 2010 |
| Publisher: | John Wiley & Sons, Limited
|
| Book Format: | Hardback |
| List Price: | AUD $227.95 |
Book Description:
|
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.