阴极，反应气体和磁控溅射 |
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| Author:
| Depla, Diederik |
| Translator:
| 强, 董 |
| ISBN: | 978-1-4709-4946-4 |
| Publication Date: | Dec 2022 |
| Publisher: | Lulu Press, Inc.
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| Book Format: | Hardback |
| List Price: | Contact Supplier contact
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Book Description:
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This book is the Chinese version of the handbook "Reactive gases, sputtering and magnetrons." The book discusses all fundamental aspects of reactive magnetron sputtering. It includes chapters on sputtering, magnetron discharge, target processes, film growth and stress evolution. It also provide review question for each chapter. The last chapter is a practical guide.
This book is the Chinese version of the handbook "Reactive gases, sputtering and magnetrons." The book discusses all fundamental aspects of reactive magnetron sputtering. It includes chapters on sputtering, magnetron discharge, target processes, film growth and stress evolution. It also provide review question for each chapter. The last chapter is a practical guide.