Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applications |
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| Author:
| Kääriäinen, Tommi
Cameron, David
Kääriäinen, Marja-Leena
Sherman, Arthur |
| ISBN: | 978-1-118-74734-6 |
| Publication Date: | May 2013 |
| Publisher: | John Wiley & Sons, Incorporated
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| Imprint: | Wiley-Scrivener |
| Book Format: | Digital download |
| List Price: | Contact Supplier contact
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Book Description:
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of...
More DescriptionSince the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.