Handbook of Photomask Manufacturing Technology |
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| Editor:
| Rizvi, Syed |
| ISBN: | 978-1-4200-2878-2 |
| Publication Date: | Oct 2018 |
| Publisher: | Taylor & Francis Group
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| Imprint: | CRC Press |
| Book Format: | Digital (delivered electronically) |
| List Price: | USD $220.00USD $405.00USD $300.00 |
Book Description:
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As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government,...
More DescriptionAs the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and X-ray lithography.