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Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing( )
Author: Mattox, Donald M.
ISBN:978-0-8155-1422-0
Publication Date:Dec 1998
Publisher:Elsevier Science & Technology Books
Imprint:William Andrew
Book Format:Hardback
List Price:USD $290.00
Book Description:

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization,...
More Description

Book Details
Pages:944
Detailed Subjects: Technology & Engineering / General
Technology & Engineering / Materials Science / General
Science / Chemistry / General
Science / Chemistry / Analytic
Physical Dimensions (W X L X H):6 x 9 x 2.48 Inches
Book Weight:3.85 Pounds



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