Lithography Principles, Processes and Materials |
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| Author:
| Hennessy, Theodore C. |
| Series title: | Engineering Tools, Techniques and Tables Ser. |
| ISBN: | 978-1-61761-837-6 |
| Publication Date: | Jan 2011 |
| Publisher: | Nova Science Publishers, Incorporated
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| Book Format: | Hardback |
| List Price: | USD $129.00 |
Book Description:
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Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). Optical lithography was the first and the earliest microfabrication technology used in semiconductor IC manufacturing. It is still the main tool of lithography in today's very large scale integrated circuits and MEMS. This book presents topical research from across the globe in the study of...
More DescriptionLithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). Optical lithography was the first and the earliest microfabrication technology used in semiconductor IC manufacturing. It is still the main tool of lithography in today's very large scale integrated circuits and MEMS. This book presents topical research from across the globe in the study of lithography; its principles, processes and materials. Topics discussed herein include nanofabrication in electron beam lithography; submicron gratings prepared by laser interference lithography; thermal electric field imprinting lithography; local anodic oxidation and other alternative lithography techniques; as well as nanosphere lithography to enable plasmonic applications.