Nanoimprint Lithography Principles, Processes and Materials |
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| Author:
| Lan, Hongbo
Ding, Yucheng
Liu, Hongzhong |
| Series title: | Series: Nanotechnology Science and Technology Ser. |
| ISBN: | 978-1-61122-501-3 |
| Publication Date: | Jan 2011 |
| Publisher: | Nova Science Publishers, Incorporated
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| Book Format: | Paperback |
| List Price: | USD $43.00 |
Book Description:
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Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical...
More DescriptionLithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.