Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
|
| Author:
| Shim, Seongbo
Shin, Youngsoo |
| Series title: | NanoScience and Technology Ser. |
| ISBN: | 978-3-319-76293-7 |
| Publication Date: | Apr 2018 |
| Publisher: | Springer International Publishing AG
|
| Imprint: | Springer |
| Book Format: | Hardback |
| List Price: | USD $139.99USD $109.99 |
Book Description:
|
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.