Plasma Etching Fundamentals and Applications |
|
| Author:
| Sugawara, M. |
| As told to:
| Stansfield, Barry L.
Handa, S.
Fujita, K.
Watanabe, S.
Tsukamoto, T. |
| Series title: | Series on Semiconductor Science and Technology Ser. |
| ISBN: | 978-0-19-856287-0 |
| Publication Date: | Jul 1998 |
| Publisher: | Oxford University Press, Incorporated
|
| Book Format: | Hardback |
| List Price: | USD $245.00 |
Book Description:
|
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.