Ultra Clean Processing of Silicon Surfaces |
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| Editor:
| Heyns, Marc
Meuris, Marc
Mertens, Paul |
| Series title: | Solid State Phenomena Vols. 76-77 Ser. |
| ISBN: | 978-3-908450-57-3 |
| Publication Date: | Feb 2001 |
| Publisher: | Trans Tech Publications, Limited
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| Book Format: | Paperback |
| List Price: | USD $243.00 |
Book Description:
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The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after...
More DescriptionThe proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).