Reliability Wearout Mechanisms in Advanced CMOS Technologies |
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| Author:
| Strong, Alvin W.
Wu, Ernest Y.
Vollertsen, Rolf-Peter
Sune, Jordi
La Rosa, Giuseppe
Sullivan, Timothy D.
Rauch, Stewart E.
Vollertsen, Rolf-Peter
Rauch, Stewart E. |
| Series title: | IEEE Press Series on Microelectronic Systems Ser. |
| ISBN: | 978-0-470-45526-5 |
| Publication Date: | Oct 2009 |
| Publisher: | John Wiley & Sons, Incorporated
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| Imprint: | Wiley-IEEE Press |
| Book Format: | Digital online |
| List Price: | USD $203.95 |
Book Description:
|
This invaluable resource tells the complete story of failure mechanisms--from basic concepts to the tools necessary to conduct reliability tests and analyze the results. Both a text and a reference work for this important area of semiconductor technology, it assumes no reliability education or experience. It also offers the first reference book with all relevant physics, equations, and step-by-step procedures for CMOS technology reliability in one place. Practical appendices provide...
More DescriptionThis invaluable resource tells the complete story of failure mechanisms--from basic concepts to the tools necessary to conduct reliability tests and analyze the results. Both a text and a reference work for this important area of semiconductor technology, it assumes no reliability education or experience. It also offers the first reference book with all relevant physics, equations, and step-by-step procedures for CMOS technology reliability in one place. Practical appendices provide basic experimental procedures that include experiment design, performing stressing in the laboratory, data analysis, reliability projections, and interpreting projections.